6.1 The MOS Capacitor - Introduction
Table of Contents -
Glossary -
Study Aids -
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In this section:
- Introduction
- The MOS structure
Next: 6.2 MOS Energy band diagram
6.1.1 Introduction
The primary reason to study the MOS capacitor is to understand
the principle of operation as well as the detailed analysis
of the MOSFET. In this chapter we introduce the Metal-Oxide-
Silicon (MOS) structure and its four different modes of operation,
namely accumulation, flatband, depletion and inversion. We then
consider the flatband voltage in more detail and present the the
exact
analytical solution which we use to discuss the issue of the
inversion layer charge and compare it to the simple
MOS capacitance
model.
6.1.2 The MOS structure
The MOS capacitor consists of a Metal-Oxide-Semiconductor structure as shown
in the figure below. Electrical contacts are made to the metal gate
and the back contact to the semiconductor. Also shown is the
charge
distribution in the structure under
acccumulation, depletion and inversion
conditions.

mos.gif
Fig.6.1.1 Charges in a Metal-Oxide-Semiconductor structure under accumulation,
depletion and inversion conditions
Accumulation occurs typically for negative voltages where the negative charge on the
gate attracts holes from the substrate to the oxide-semiconductor interface.
Depletion occurs for positive voltages; The positive charge on the gate pushes the mobile
holes into the substrate, thereby depleting the semiconductor of the mobile carriers and
leaving a negative charge in the space charge region which is due to the ionized acceptor
ions. The voltage separating the accumulation and depletion regime is refered to as
the flatband voltage. Inversion occurs at more positive voltages which are larger than the threshold
voltage. In addition to the depletion layer charge a negatively charged inversion layer forms
at the oxide-semiconductor interface.
6.
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© Bart J. Van Zeghbroeck, 1996, 1997