
It consists of a laser (commonly a 632.8 nm helium/neon laser), a polarizer and a quarter wave plate which provide a state of polarization which can be varied from linearly polarized light to elliptically polarized light to circularly polarized light by varying the angle of the polarizer. The beam is reflected off the layer of interest and then analyzed with the analyzer. The operator changes the angle of the polarizer and analyzer until a minimal signal is detected. This minimum signal is detected if the light reflected by the sample is linearly polarized, while the analyzer is set so that only light with a polarization which is perpendicular to the incoming polarization is allowed to pass. The angle of the analyzer is therefore related to the direction of polarization of the reflected light if the null condition is satisfied. In order to obtain linearly polarized light after reflection, the polarizer must provide an optical retardation between the two incoming polarizations which exactly compensates for the optical retardation caused by the polarization dependent reflections at each dielectric interface. Since the amplitude of both polarizations was set to be equal, the ratio of the amplitudes after reflection equals the tangent of the angle of the analyzer with respect to the normal.
(ell1)
(opt4)
(ell5)
(ell6)with
(ell7)
RTE = rTE rTE* is the reflectivity if the electric field is transverse to the propagation direction and parallel to the interface while RTM = rTM rTM* is the reflectivity if the magnetic field is transverse to the propagation direction and parallel to the interface. These reflectivities are angle dependent as well as being different for each polarization. An example of the reflection as a function of the incident angle is shown in the figure below:

The two dielectric interfaces yield a combined reflection coefficient which can be obtained using the Fabry-Perot equations:
(ell8)
(ell9)
(ell10)
(ell11)
Y =
A1 = p -
A2 = (A1 - A2 +
p)/2
The minimal signal is obtained when both polarizations incident on the analyzer are in phase. This can be obtained for two different positions of the polarizer, hence the two values P1 and P2. In principle one could measure either one. In practice both values are measured to eliminate any possible misalignment of the instrument thereby yielding a more accurate result. Y - D curves are typically used to visualize the ellipsometer parameters for different layer thickness and refractive index. An example of such curves as obtained for silicon dioxide layers (n1 = 1.455) on silicon (n2 = 3.875 - 0.018 i ) using a helium-neon laser (l = 632.8 nm) is shown below.


The table below lists the refractive index n* = n - i k for different materials as well as the minimum or maximum angle of the analyzer and the half wavelength thickness when using a He/Ne laser and an incident angle of 70 degrees.
The refractive indices from this table can be used to generate the Y - D curves for any material combination. In addition the minimum/maximum value of A1 can be used to help identify an unknown material, since it is directly related to the refractive index which is unique for each material. However when using this technique one should realize that the surface of the material should be polished and clean. A thin oxide layer (1 - 3 nm) which naturally grows on most materials must therefore be removed before measuring A1. Since the cleaning procedures vary from material to material, this technique is rather limited when trying to identify unknown materials. However it is a very sensitive and therefore valuable technique to verify that one has a clean surface.