Table of Contents - 1 2 3 4 5 6 7 8 9 R S ¬ ®
aA bB cC dD eE fF gG hH iI jJ kK lL mM nN oO pP qQ rR sS tT uU vV wW xX yY zZ
a b g G d D e z h q Q i k l L m n N x X p P r s S t u f F c y Y w W
|
Symbol |
Description |
||
|
a0 |
m |
||
|
A |
Area |
m2 |
|
|
B |
|||
|
B |
Magnetic field |
Tesla |
|
|
C |
|||
|
c |
Speed of light in vacuum - value |
m/s |
|
|
C |
Capacitance |
F |
|
|
CD |
Diffusion capacitance per unit area |
F/m2 |
|
|
CDS |
Drain-source capacitance |
F |
|
|
CFB |
Flatband capacitance per unit area of a MOS structure |
F/m2 |
|
|
CG |
Gate capacitance |
F |
|
|
CGS |
Gate-source capacitance |
F |
|
|
CGD |
Gate-drain capacitance |
F |
|
|
CHF |
High-frequency capacitance per unit area of a MOS structure |
F/m2 |
|
|
Cj |
Junction capacitance per unit area |
F/m2 |
|
|
CLF |
Low-frequency (quasi-static) capacitance per unit area of a MOS structure |
F/m2 |
|
|
CM |
Miller capacitance |
F |
|
|
COX |
Oxide capacitance per unit area |
F/m2 |
|
|
Cs |
Semiconductor capacitance per unit area |
F/m2 |
|
|
D |
|||
|
Dn |
Electron diffusion constant |
m2/s |
|
|
Dp |
Hole diffusion constant |
m2/s |
|
|
E |
|||
|
E |
Energy |
Joule |
|
|
E |
Electric Field |
V/m |
|
|
Ea |
Acceptor energy |
Joule |
|
|
Ec |
Conduction band energy of a semiconductor - 2.2.3.4 |
Joule |
|
|
Ed |
Donor energy |
Joule |
|
|
EF |
Joule |
||
|
EF,n |
Fermi energy in an n-type semiconductor |
Joule |
|
|
EF,p |
Fermi energy in a p-type semiconductor |
Joule |
|
|
Eg |
Joule |
||
|
Ei |
Joule |
||
|
Ev |
Valence band energy of a semiconductor 2.2.3.4 |
Joule |
|
|
f(E) |
Distribution function (probability density function) - 2.4 - Fig |
||
|
fBE(E) |
|||
|
fFD(E) |
|||
|
fMB(E) |
|||
|
F |
Force |
Newton |
|
|
Fn |
Quasi-Fermi energy of electrons |
Joule |
|
|
Fp |
Quasi-Fermi energy of holes |
Joule |
|
|
g(E) |
Density of states per unit energy and per unit volume - 2.3 - Fig |
m-3J-1 |
|
|
gc |
Density of states in the conduction band per unit energy and per unit volume - Eq |
m-3J-1 |
|
|
gc,3D |
3-dimensional density of states in the conduction band per unit energy and per unit volume - Eq |
m-3J-1 |
|
|
gc,2D |
2-dimensional density of states in the conduction band per unit energy and per unit area - Eq |
m-2J-1 |
|
|
gc,1D |
1-dimensional density of states in the conduction band per unit energy and per unit length - Eq |
m-1J-1 |
|
|
gv |
Density of states in the valence band per unit energy and per unit volume - Eq |
m-3J-1 |
|
|
gd |
S |
||
|
gm |
S |
||
|
G |
Carrier generation rate |
m-3s-1 |
|
|
Gh |
Hole generation rate |
m-3s-1 |
|
|
Gn |
Electron generation rate |
m-3s-1 |
|
|
h |
Planck's constant - value |
Js |
|
|
I |
Current |
A |
|
|
ID |
Drain current of a MOSFET |
A |
|
|
J |
Current density |
A/m2 |
|
|
Jn |
Electron current density |
A/m2 |
|
|
Jp |
Hole current density |
A/m2 |
|
|
k |
Boltzmann's constant - value |
J/K |
|
|
L |
Length |
m |
|
|
LD |
Debye length |
m |
|
|
Ln |
Electron diffusion length |
m |
|
|
Lp |
Hole diffusion length |
m |
|
|
m0 |
Free electron mass - value |
kg |
|
|
mn* |
Effective mass of electrons - 2.2.3.5 |
kg |
|
|
mp* |
Effective mass of holes - 2.2.3.5 |
kg |
|
|
M |
Proton mass - value |
kg |
|
|
n |
m-3 |
||
|
ni |
Intrinsic carrier density |
m-3 |
|
|
n(E) |
Electron density per unit energy and per unit volume - 2.5.4 - Eq |
m-3 |
|
|
n0 |
Electron density in thermal equlibrium - Eq |
m-3 |
|
|
ni |
m-3 |
||
|
nn |
Electron density in an n-type semiconductor |
m-3 |
|
|
nn0 |
Thermal equilibrium electron density in an n-type semiconductor |
m-3 |
|
|
np |
Electron density in a p-type semiconductor |
m-3 |
|
|
np0 |
Thermal equilibrium electron density in a p-type semiconductor |
m-3 |
|
|
N |
Number of particles |
||
|
Na |
Acceptor doping density |
m-3 |
|
|
Na- |
Ionized acceptor density |
m-3 |
|
|
NA |
Avogadro's number - value |
||
|
NC |
Effective density of states in the conduction band - 2.7 - Eq |
m-3 |
|
|
Nd |
Donor doping density |
m-3 |
|
|
Nd+ |
Ionized donor density |
m-3 |
|
|
Nss |
Surface state density |
m-2 |
|
|
Nt |
Recombination trap density |
m-2 |
|
|
NV |
m-3 |
||
|
p |
m-3 |
||
|
p(E) |
m-3 |
||
|
p0 |
Hole density in thermal equilibrium - Eq |
m-3 |
|
|
pn |
Hole density in an n-type semiconductor |
m-3 |
|
|
pn0 |
Thermal equilibrium hole density in an n-type semiconductor |
m-3 |
|
|
pp |
Hole density in a p-type semiconductor |
m-3 |
|
|
pp0 |
Thermal equilibrium hole density in a p-type semiconductor |
m-3 |
|
|
q |
electronic charge - value |
C |
|
|
Qd |
Charge density per unit area in the depletion layer of an MOS structure - 6.5 - Eq |
C/m2 |
|
|
Qd,T |
Charge density per unit area at threshold in the depletion layer of an MOS structure - 6.5 - Eq |
C/m2 |
|
|
Qi |
Interface charge density per unit area |
C/m2 |
|
|
Qinv |
Inversion layer charge density per unit area |
C/m2 |
|
|
Qss |
Surface state charge density per unit area |
C/m2 |
|
|
R |
Resistance |
Ohm |
|
|
R |
The Rydberg constant - value |
J |
|
|
Rn |
Electron recombination rate |
m-3s-1 |
|
|
Rp |
Hole recombination rate |
m-3s-1 |
|
|
t |
Thickness |
m |
|
|
t |
Time |
s |
|
|
tox |
Oxide thickness |
m |
|
|
T |
Temperature |
Kelvin |
|
|
UA |
Auger recombination rate |
m-3s-1 |
|
|
Ub-b |
Band-to-band recombination rate |
m-3s-1 |
|
|
USHR |
Schockley-Read-Hall recombination rate |
m-3s-1 |
|
|
v |
Velocity |
m/s |
|
|
vth |
Thermal velocity |
m/s |
|
|
V |
Voltage |
V |
|
|
Va |
Applied voltage |
V |
|
|
VA |
Early voltage |
V |
|
|
VB |
Base voltage |
V |
|
|
VC |
Collector voltage |
V |
|
|
VD |
Drain voltage |
V |
|
|
VDS |
Drain-source voltage |
V |
|
|
VDS,sat |
Drain-source saturation voltage - 7.2.4 - eq.gif7.2.4 - 7.2.5 - Eq |
V |
|
|
VG |
Gate voltage |
V |
|
|
Vt |
Thermal voltage - value |
V |
|
|
VT |
Threshold voltage of an MOS structure - 6.5 - 7.3 - Fig - Eq |
V |
|
|
W |
Width |
m |
|
|
xd |
m |
||
|
xd,T |
Depletion layer width in an MOS structure at threshold - 6.5 - Eq |
m |
|
|
xj |
Junction depth |
m |
|
|
xn |
Depletion layer width in an n-type semiconductor |
m |
|
|
xp |
Depletion layer width in a p-type semiconductor |
m |
|
|
Absorption coefficient |
1/m |
||
|
e 0 |
Permittivity of vacuum - value |
F/m |
|
|
e ox |
Dielectric constant of the oxide |
F/m |
|
|
e rs |
Relative dielectric constant of the semiconductor |
F/m |
|
|
e s |
Dielectric constant of the semiconductor |
F/m |
|
|
m 0 |
Permeability of vacuum - value |
H/m |
|
|
m n |
Electron mobility |
m2/V-s |
|
|
m p |
Hole mobility |
m2/V-s |
|
|
r |
Ohm m |
||
|
r |
C/m3 |
||
|
r ox |
Charge density per unit volume in the oxide |
C/m3 |
|
|
r |
Ohm m |
||
|
f |
Potential |
V |
|
|
f B |
V |
||
|
f F |
V |
||
|
f i |
Built-in potential of a p-n diode (4.3 - Eq) |
V |
|
|
f s |
Potential at the semiconductor surface |
V |
|
|
F M |
Workfunction of the metal |
V |
|
|
F S |
Workfunction of the semiconductor |
V |
|
|
F MS |
Workfunction difference between the metal and the semiconductor |
V |
|
|
c |
Electron affinity of the semiconductor |
V |
© Bart J. Van Zeghbroeck, 1996, 1997